Invention Grant
- Patent Title: Apparatus for detecting position of substrate, ellipsometer, and film thickness measuring apparatus
- Patent Title (中): 用于检测基板,椭偏仪和膜厚测量装置的位置的装置
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Application No.: US12197728Application Date: 2008-08-25
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Publication No.: US07557919B2Publication Date: 2009-07-07
- Inventor: Kumiko Fukue
- Applicant: Kumiko Fukue
- Applicant Address: JP Kyoto
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPP2007-229055 20070904
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.
Public/Granted literature
- US20090059229A1 APPARATUS FOR DETECTING POSITION OF SUBSTRATE, ELLIPSOMETER, AND FILM THICKNESS MEASURING APPARATUS Public/Granted day:2009-03-05
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