Invention Grant
- Patent Title: Extreme low resistivity light attenuation anti-reflection coating structure and method for manufacturing the same
- Patent Title (中): 极低电阻率光衰减抗反射涂层结构及其制造方法
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Application No.: US11905886Application Date: 2007-10-05
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Publication No.: US07655280B2Publication Date: 2010-02-02
- Inventor: Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- Applicant: Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- Applicant Address: TW Hsinchu
- Assignee: Innovation & Infinity Global Corp.
- Current Assignee: Innovation & Infinity Global Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Rosenberg, Klein & Lee
- Main IPC: B05D1/36
- IPC: B05D1/36 ; B05D5/12 ; B32B15/04 ; B32B15/20
Abstract:
A extreme low resistivity light attenuation anti-reflection coating structure includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of Ti-based oxide coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.
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