Invention Grant
- Patent Title: Front plate for an ion source
- Patent Title (中): 用于离子源的前板
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Application No.: US11790682Application Date: 2007-04-26
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Publication No.: US07655924B2Publication Date: 2010-02-02
- Inventor: Richard David Goldberg , Christopher Burgess
- Applicant: Richard David Goldberg , Christopher Burgess
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Priority: GB0608528 20060428
- Main IPC: H01J37/08
- IPC: H01J37/08

Abstract:
The present invention relates to a front plate for an ion source that is suitable for an ion implanter. The front plate according to the invention comprises obverse and reverse sides, an exit aperture for allowing egress of ions from the ion source that extends substantially straight through the front plate between the obverse and reverse sides, and a slot penetrating through the front plate from obverse side to reverse side at a slant for at least part of its depth, the slot extending from a side of the front plate to join the exit aperture. The slot is slanted to occlude line of sight into the ion source when viewed from in front, yet provides an expansion gap.
Public/Granted literature
- US20080048131A1 Front plate for an ion source Public/Granted day:2008-02-28
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