Invention Grant
US07658858B2 Band filter using film bulk acoustic resonator and method of fabricating the same
有权
使用膜体声波谐振器的带滤波器及其制造方法
- Patent Title: Band filter using film bulk acoustic resonator and method of fabricating the same
- Patent Title (中): 使用膜体声波谐振器的带滤波器及其制造方法
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Application No.: US11337574Application Date: 2006-01-24
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Publication No.: US07658858B2Publication Date: 2010-02-09
- Inventor: Seog-woo Hong , Byeong-ju Ha , In-sang Song , Kyu-sik Kim
- Applicant: Seog-woo Hong , Byeong-ju Ha , In-sang Song , Kyu-sik Kim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2005-0006771 20050125
- Main IPC: H01B13/00
- IPC: H01B13/00

Abstract:
A band filter using a film bulk acoustic resonator and a method of fabricating the same. The method includes the steps of forming a membrane layer on a substrate, forming a plurality of resonators on an upper surface of the membrane layer, depositing a mask layer on a lower surface of the membrane layer and patterning the mask layer to form a plurality of main windows and sub windows, and forming cavities along the main windows in the substrate and forming sub walls in the cavities in such a way that the sub walls are separated apart from the membrane layer by using the notch effect caused during a dry etching. It is possible to precisely form cavities with desired sizes even if the cavities have different sizes, to reduce the notched areas in the cavities, to reduce the total size of the filter by decreasing a distance between the cavities and to reduce the total length of wires.
Public/Granted literature
- US20060164187A1 Band filter using film bulk acoustic resonator and method of fabricating the same Public/Granted day:2006-07-27
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