Invention Grant
- Patent Title: System and method for contrast enhanced zone plate array lithography
- Patent Title (中): 对比增强区板阵列光刻的系统和方法
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Application No.: US12337000Application Date: 2008-12-17
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Publication No.: US07666580B2Publication Date: 2010-02-23
- Inventor: Rajesh Menon , Henry I. Smith
- Applicant: Rajesh Menon , Henry I. Smith
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gauthier & Conners LLP
- Main IPC: G03F7/22
- IPC: G03F7/22
Abstract:
A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.
Public/Granted literature
- US20090087797A1 SYSTEM AND METHOD FOR CONTRAST ENHANCED ZONE PLATE ARRAY LITHOGRAPHY Public/Granted day:2009-04-02
Information query
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