Invention Grant
- Patent Title: High-frequency semiconductor device
- Patent Title (中): 高频半导体器件
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Application No.: US11779904Application Date: 2007-07-19
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Publication No.: US07667322B2Publication Date: 2010-02-23
- Inventor: Kazutaka Takagi
- Applicant: Kazutaka Takagi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-125328 20060428
- Main IPC: H01L23/34
- IPC: H01L23/34

Abstract:
An example of a high-frequency semiconductor device includes two unit semiconductor devices. Each of the two unit semiconductor devices has a ground substrate, a high-frequency semiconductor element, an input-side matching circuit, an output-side matching circuit, a side wall member, an input terminal, and an output terminal. The ground substrate has heat-radiating property. The high-frequency semiconductor element is provided on the ground substrate. The input-side matching circuit is connected to the high-frequency semiconductor element. The output-side matching circuit is connected to the high-frequency semiconductor element. The side wall member surrounds at least the high-frequency semiconductor element. The input terminal is connected to the input-side matching circuit. The output terminal is connected to the output-side matching circuit. The two unit semiconductor devices are coupled to each other at upper edges of the side wall members.
Public/Granted literature
- US20070290335A1 HIGH-FREQUENCY SEMICONDUCTOR DEVICE Public/Granted day:2007-12-20
Information query
IPC分类: