Invention Grant
- Patent Title: Method of manufacturing hybrid structure of multi-layer substrates
- Patent Title (中): 制造多层基板混合结构的方法
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Application No.: US11856867Application Date: 2007-09-18
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Publication No.: US07687312B2Publication Date: 2010-03-30
- Inventor: Chih-kuang Yang
- Applicant: Chih-kuang Yang
- Applicant Address: TW Hsinchu
- Assignee: Princo Corp.
- Current Assignee: Princo Corp.
- Current Assignee Address: TW Hsinchu
- Priority: TW95145488A 20061206
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Disclosed is a method of manufacturing a hybrid structure of multi-layer substrates. The method comprises steps of: separating a border district of at least one metal layer connecting with a border district of the corresponding dielectric layer from adjacent metal layers and adjacent dielectric layers for each multi-layer substrate and connecting a separated border of a metal layer of one multi-layer substrate with a separated border district of a metal layer of another multi-layer substrate to form a connection section. The hybrid structure comprises at least a first multi-layer substrate and a second multi-layer substrate. At least one first metal layer is connected with at least one second metal layer to form a connection section.
Public/Granted literature
- US20080136021A1 METHOD OF MANUFACTURING HYBRID STRUCTURE OF MULTI-LAYER SUBSTRATES AND HYBRID STRUCTURE THEREOF Public/Granted day:2008-06-12
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