Invention Grant
- Patent Title: High temperature silicone processing of fuser structure
- Patent Title (中): 定影结构的高温硅胶加工
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Application No.: US11879153Application Date: 2007-07-16
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Publication No.: US07691446B2Publication Date: 2010-04-06
- Inventor: David C. Irving , Daniel L. Coughlin , Patrick Finn
- Applicant: David C. Irving , Daniel L. Coughlin , Patrick Finn
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agent James J. Ralabate
- Main IPC: B05D3/02
- IPC: B05D3/02
Abstract:
This is a process to restore compression set properties of a silicone rubber fuser structure that has been damaged during the coating of the silicone with Teflon; Teflon is a registered trademark of DuPont. This restoration is achieved by re-baking the coated fuser roll at temperatures of 175° C. to 275° C. This will improve the compression set and will give the fuser structure improved life and provide better image quality.
Public/Granted literature
- US20090022897A1 High temperature silicone processing of fuser structure Public/Granted day:2009-01-22
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