Invention Grant
US07692868B2 Lithography projection objective, and a method for correcting image defects of the same
有权
平版印刷投影物镜,以及用于校正图像缺陷的方法
- Patent Title: Lithography projection objective, and a method for correcting image defects of the same
- Patent Title (中): 平版印刷投影物镜,以及用于校正图像缺陷的方法
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Application No.: US12265090Application Date: 2008-11-05
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Publication No.: US07692868B2Publication Date: 2010-04-06
- Inventor: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- Applicant: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G02B9/00
- IPC: G02B9/00 ; G03B27/42 ; G03F7/00

Abstract:
Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
Public/Granted literature
- US20090103184A1 LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME Public/Granted day:2009-04-23
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