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1.发明授权公开(公告)号：US08902407B2
公开(公告)日：2014-12-02
申请号：US13272440
申请日：2011-10-13
Applicant: Norbert Wabra , Robert Eder
Inventor： Norbert Wabra , Robert Eder
CPC classification number: G03F7/706 , G02B27/0025 , G03F7/7015 , G03F7/70191 , G03F7/70225 , G03F7/70241 , G03F7/70308 , G03F7/70591 , G03F7/70975
Abstract: A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.
Abstract translation: 微光刻投影曝光装置的投影物镜包含配置在投影物镜的N≥2个连续部分A1〜AN中的多个光学元件，这些光学元件通过光瞳平面或中间像平面彼此分开。 根据本发明，为了校正波前变形，至少两个光学元件各自具有非球面地局部再加工的光学活性表面。 在这种情况下，第一光学元件被布置在一个部分Aj，j = 1中。 。 。 N和第二光学元件布置在另一部分Ak，k = 1中。 。 。 N，幅度差| k-j | 是奇数。
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公开(公告)号：US20130070221A1
公开(公告)日：2013-03-21
申请号：US13613486
申请日：2012-09-13
Applicant: Boris Bittner , Norbert Wabra
Inventor： Boris Bittner , Norbert Wabra
CPC classification number: G03F7/70883 , G03F7/7005
Abstract: A microlithographic projection exposure apparatus includes a projection light source, a heating light source, a catoptric projection lens and a reflecting switching element, which can be arranged outside of the projection lens and can be displaced between a first position and a second position via a drive. Only the projection light can enter the projection lens in the first position of the switching element, and only the heating light can enter the projection lens in the second position of the switching element.
Abstract translation: 微光刻投影曝光装置包括投影光源，加热光源，反射投影透镜和反射开关元件，其可以布置在投影透镜的外部，并且可以经由驱动器在第一位置和第二位置之间移动 。 只有投影光可以在开关元件的第一位置进入投影透镜，并且只有加热光可以在开关元件的第二位置进入投影透镜。
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3.发明授权公开(公告)号：US08319944B2
公开(公告)日：2012-11-27
申请号：US12825001
申请日：2010-06-28
Applicant: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
Inventor： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
CPC classification number: G03F7/70341 , G03F7/70891
Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
Abstract translation: 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。
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4.发明申请公开(公告)号：US20120019800A1
公开(公告)日：2012-01-26
申请号：US13245116
申请日：2011-09-26
Applicant: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
Inventor： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
CPC classification number: G03F7/70341 , G03F7/7015
Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
Abstract translation: 用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件 。 光学元件包括光学元件之后的物体平面上的第一组和最后一个光学元件，该光学元件跟随第一组并且邻近于图像平面并且限定投影物镜的出射表面并且被布置在 与图像平面的距离。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。
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5.发明申请公开(公告)号：US20080123069A1
公开(公告)日：2008-05-29
申请号：US11570263
申请日：2005-06-02
Applicant: Norbert Wabra , Robert Eder
Inventor： Norbert Wabra , Robert Eder
IPC: G03B27/68
CPC classification number: G03F7/706 , G02B27/0025 , G03F7/7015 , G03F7/70191 , G03F7/70225 , G03F7/70241 , G03F7/70308 , G03F7/70591 , G03F7/70975
Abstract: A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N≧2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.
Abstract translation: 微光刻投影曝光装置的投影物镜包含多个光学元件，其布置在投影物镜的N> = 2个连续部分A 1到A N N中， 另一个是瞳孔飞机或中间飞机。 根据本发明，为了校正波前变形，至少两个光学元件各自具有非球面地局部再加工的光学活性表面。 在这种情况下，第一光学元件被布置在一个部分A j，j = 1中。 。 。 N和第二光学元件布置在另一部分A N k，k = 1中。 。 。 N，幅度差| k-j | 是奇数。
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Patent Agency Ranking
6.发明授权Lithography projection objective, and a method for correcting image defects of the same 有权平版印刷投影物镜，以及用于校正图像缺陷的方法公开(公告)号：US08879159B2
公开(公告)日：2014-11-04
申请号：US13245116
申请日：2011-09-26
Applicant: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
Inventor： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
CPC classification number: G03F7/70341 , G03F7/7015
Abstract: The disclosure provides a microlithography projection objective which includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes a last optical element and a penultimate optical element. A distance between the last optical element and the penultimate optical element is variable. The disclosure also provides a microlithography projection exposure machine including such a projection objective, and a method of making semiconductor components using such a projection exposure machine.
Abstract translation: 本公开提供了一种微光刻投影物镜，其包括沿投影物镜的光轴的多个光学元件。 多个光学元件包括最后的光学元件和倒数第二个光学元件。 最后一个光学元件与倒数第二个光学元件之间的距离是可变的。 本公开还提供了包括这种投影物镜的微光刻投影曝光机，以及使用这种投影曝光机制造半导体元件的方法。
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7.发明授权公开(公告)号：US07782440B2
公开(公告)日：2010-08-24
申请号：US11719074
申请日：2005-11-17
Applicant: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
Inventor： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
CPC classification number: G03F7/70341 , G03F7/70891
Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
Abstract translation: 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。
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8.发明授权Lithography projection objective, and a method for correcting image defects of the same 有权平版印刷投影物镜，以及用于校正图像缺陷的方法公开(公告)号：US07463423B2
公开(公告)日：2008-12-09
申请号：US11955662
申请日：2007-12-13
Applicant: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
Inventor： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
CPC classification number: G03F7/70341 , G03F7/7015
Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
Abstract translation: 用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件 。 光学元件包括光学元件之后的物体平面上的第一组和最后一个光学元件，该光学元件跟随第一组并且邻近于图像平面并且限定投影物镜的出射表面并且被布置在 与图像平面的距离。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。
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9.发明申请公开(公告)号：US20080144184A1
公开(公告)日：2008-06-19
申请号：US11955662
申请日：2007-12-13
Applicant: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
Inventor： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC: G02B3/00
CPC classification number: G03F7/70341 , G03F7/7015
Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
Abstract translation: 用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件 。 光学元件包括光学元件之后的物体平面上的第一组和最后一个光学元件，该光学元件跟随第一组并且邻近于图像平面并且限定投影物镜的出射表面并且被布置在 与图像平面的距离。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。
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10.发明申请公开(公告)号：US20080106711A1
公开(公告)日：2008-05-08
申请号：US11719074
申请日：2005-11-17
Applicant: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
Inventor： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
CPC classification number: G03F7/70341 , G03F7/70891
Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
Abstract translation: 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。
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