Invention Grant
- Patent Title: Method for high precision printing of patterns
- Patent Title (中): 高精度打印图案的方法
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Application No.: US10557099Application Date: 2004-06-14
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Publication No.: US07755657B2Publication Date: 2010-07-13
- Inventor: Torbjorn Sandstrom , Hans Martinsson
- Applicant: Torbjorn Sandstrom , Hans Martinsson
- Applicant Address: SE Taby
- Assignee: Micronic Laser Systems AB
- Current Assignee: Micronic Laser Systems AB
- Current Assignee Address: SE Taby
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Ernest J. Beffel, Jr.
- International Application: PCT/SE2004/000936 WO 20040614
- International Announcement: WO2004/111701 WO 20041223
- Main IPC: B41J2/47
- IPC: B41J2/47 ; G21K5/10
Abstract:
The present invention includes a method to print patterns with improved edge acuity. The method for printing fine patterns comprises the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude.
Public/Granted literature
- US20070165098A1 Method for high precision printing of patterns Public/Granted day:2007-07-19
Information query
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