Invention Grant
- Patent Title: Process for manufacturing a reference leak
- Patent Title (中): 制造参考泄漏的过程
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Application No.: US11228967Application Date: 2005-09-16
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Publication No.: US07757371B2Publication Date: 2010-07-20
- Inventor: Liang Liu , Jie Tang , Peng Liu , Zhao-Fu Hu , Bing-Chu Du , Cai-Lin Guo , Pi-Jin Chen , Shuai-Ping Ge , Shou-Shan Fan
- Applicant: Liang Liu , Jie Tang , Peng Liu , Zhao-Fu Hu , Bing-Chu Du , Cai-Lin Guo , Pi-Jin Chen , Shuai-Ping Ge , Shou-Shan Fan
- Applicant Address: CN Beijing TW Tu-Cheng, Taipei Hsien
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW Tu-Cheng, Taipei Hsien
- Agent Jeffrey T. Knapp
- Priority: CN200410091941 20041230
- Main IPC: B21B1/46
- IPC: B21B1/46 ; B21B13/22 ; B22D11/126 ; B22D11/128 ; B23P17/00 ; B23P25/00

Abstract:
A method for making a reference leak includes the steps of: (a) preparing a substrate; (b) forming a patterned catalyst layer on the substrate, the patterned catalyst layer comprising one or more catalyst blocks; (c) forming one or more elongate nano-structures extending from the corresponding catalyst blocks by a chemical vapor deposition method; (d) forming a leak layer of one of a metallic material, a glass material, and a ceramic material on the substrate with the one or more elongate nano-structures partly or completely embedded therein; and (e) removing the one or more elongate nano-structures and the substrate to obtain a reference leak with one or more leak holes defined therein.
Public/Granted literature
- US20060143895A1 Process for manufacturing a reference leak Public/Granted day:2006-07-06
Information query
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