Invention Grant
US07770282B2 Method of making a magnetic sensing device having an insulator structure
有权
制造具有绝缘体结构的磁感测装置的方法
- Patent Title: Method of making a magnetic sensing device having an insulator structure
- Patent Title (中): 制造具有绝缘体结构的磁感测装置的方法
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Application No.: US11219107Application Date: 2005-09-01
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Publication No.: US07770282B2Publication Date: 2010-08-10
- Inventor: Alexander M. Zeltser , Jinshan Li , Brian York
- Applicant: Alexander M. Zeltser , Jinshan Li , Brian York
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Rambod Nader
- Agent John J. Oskorep, Esq.
- Main IPC: G11B5/127
- IPC: G11B5/127 ; B05D3/04

Abstract:
A magnetic sensing device for use in a magnetic head includes a sensor stack structure having a sensing layer structure and an insulator structure formed adjacent the sensing layer structure. The insulator structure includes a plurality of oxidized metallic sublayers, a plurality of nitrided metallic sublayers, or a plurality of oxynitrided metallic sublayers. The insulator structure may be a capping layer structure of a giant magnetoresistance sensor or, alternatively, a tunnel barrier layer structure of a tunneling magnetoresistance sensor or a magnetic random access memory. Advantageously, each treated metallic sublayer is sufficiently uniformly treated so as to increase the magnetoresistive effect and improve soft magnetic properties of the magnetic sensing device. A method for use in forming the magnetic sensing device of the present application includes the steps of forming a sensor stack structure which includes a sensing layer structure; depositing a metallic layer; performing, on the metallic layer, either an oxidation, nitridation, or oxynitridation process; and repeating the steps of depositing and performing one or more times to thereby form an insulator structure.
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