Invention Grant
US07773219B2 Process and apparatus for measurements of Mueller matrix parameters of polarized light scattering
有权
用于测量偏振光散射的Mueller矩阵参数的方法和装置
- Patent Title: Process and apparatus for measurements of Mueller matrix parameters of polarized light scattering
- Patent Title (中): 用于测量偏振光散射的Mueller矩阵参数的方法和装置
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Application No.: US12082195Application Date: 2008-03-31
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Publication No.: US07773219B2Publication Date: 2010-08-10
- Inventor: Jozsef Czege , Burt V. Bronk
- Applicant: Jozsef Czege , Burt V. Bronk
- Applicant Address: US OH Wright-Patterson Air Force Base
- Assignee: The United States of America as represented by the Secretary of the Air Force
- Current Assignee: The United States of America as represented by the Secretary of the Air Force
- Current Assignee Address: US OH Wright-Patterson Air Force Base
- Agency: AFMCLO/JAZ
- Agent Christopher J. Menke; Jeffrey R. Moore
- Main IPC: G01J4/00
- IPC: G01J4/00
Abstract:
A method and apparatus for measuring Mueller matrix parameters from scattered light. The apparatus is advantageous for use in countering bioterrorism by detecting information concerning airborne pathogens, particularly microorganism in aerosol form. The system provided is portable, more efficient, and less sensitive to wavelength changes. The method uses variation in retardation over wavelength as opposed to variation in retardation with time.
Public/Granted literature
- US20090033938A1 Process and apparatus for measurements of Mueller matrix parameters of polarized light scattering Public/Granted day:2009-02-05
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