Invention Grant
US07781060B2 Hollow silica nanoparticles as well as synthesis processes and applications thereof
失效
中空二氧化硅纳米颗粒以及其合成方法和应用
- Patent Title: Hollow silica nanoparticles as well as synthesis processes and applications thereof
- Patent Title (中): 中空二氧化硅纳米颗粒以及其合成方法和应用
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Application No.: US12002916Application Date: 2007-12-18
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Publication No.: US07781060B2Publication Date: 2010-08-24
- Inventor: Weidong Li , Shivkumar Chiruvolu , Hui Du , Igor Altman , Ronald J. Mosso , Nobuyuki Kambe
- Applicant: Weidong Li , Shivkumar Chiruvolu , Hui Du , Igor Altman , Ronald J. Mosso , Nobuyuki Kambe
- Applicant Address: US CA Milpitas
- Assignee: NanoGram Corporation
- Current Assignee: NanoGram Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Dardi & Herbert, PLLC
- Agent Peter S. Dardi
- Main IPC: B32B5/16
- IPC: B32B5/16
Abstract:
Hollow silica nanoparticles can have well defined non-porous shells with low shell fragmentation and good dispersability. These well defined hollow particles can be formed through the controlled oxidation of silicon nanoparticles in an organic solvent. The hollow nanoparticles can have a submicron secondary particle sizes. The hollow silica nanoparticles can be incorporated into polymer composites, such as low index-of-refraction composites, for appropriate applications.
Public/Granted literature
- US20080145641A1 Hollow silica nanoparticles as well as synthesis processes and applications thereof Public/Granted day:2008-06-19
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