Invention Grant
- Patent Title: Method and equipment for detecting pattern defect
- Patent Title (中): 检测图案缺陷的方法和设备
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Application No.: US12271348Application Date: 2008-11-14
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Publication No.: US07791725B2Publication Date: 2010-09-07
- Inventor: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- Applicant: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP10-372769 19981228; JP11-262997 19990917
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
Public/Granted literature
- US20090073443A1 Method And Equipment For Detecting Pattern Defect Public/Granted day:2009-03-19
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