Invention Grant
- Patent Title: Electron beam apparatus having an electrode with high temperature portion
- Patent Title (中): 具有高温部分的电极的电子束装置
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Application No.: US12054051Application Date: 2008-03-24
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Publication No.: US07795795B2Publication Date: 2010-09-14
- Inventor: Jun Iba , Hisanobu Azuma
- Applicant: Jun Iba , Hisanobu Azuma
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-096402 20070402
- Main IPC: H01J1/62
- IPC: H01J1/62 ; H01J63/04

Abstract:
The invention provides an electron beam apparatus having: a rear plate having a plurality of electron-emitting devices each provided with a device electrode, and a plurality of wirings connected to the device electrodes; and a face plate being provided with an anode electrode, and being arranged in opposition to the rear plate so as to be irradiated with an electron emitted from the electron-emitting device, wherein the device electrode is electrically connected to the wiring through an additional electrode, and the additional electrode is formed from an electroconductive material of which phase transition from a solid phase directly into a vapor phase is caused at a temperature not lower than a melting point of the device electrode within an evacuated atmosphere.
Public/Granted literature
- US20080238287A1 ELECTRON BEAM APPARATUS Public/Granted day:2008-10-02
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