Invention Grant
- Patent Title: Particle beam irradiation system
- Patent Title (中): 粒子束照射系统
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Application No.: US11692331Application Date: 2007-03-28
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Publication No.: US07807982B2Publication Date: 2010-10-05
- Inventor: Hideaki Nishiuchi , Kazuyoshi Saito
- Applicant: Hideaki Nishiuchi , Kazuyoshi Saito
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, P.C.
- Priority: JP2006-089840 20060329
- Main IPC: H01J49/00
- IPC: H01J49/00

Abstract:
It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Public/Granted literature
- US20070228304A1 PARTICLE BEAM IRRADIATION SYSTEM Public/Granted day:2007-10-04
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