Invention Grant
- Patent Title: Patterning of solid state features by direct write nanolithographic printing
- Patent Title (中): 通过直写纳米光刻印刷图案固态特征
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Application No.: US11847263Application Date: 2007-08-29
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Publication No.: US07811635B2Publication Date: 2010-10-12
- Inventor: Chad A. Mirkin , Vinayak P. Dravid , Ming Su , Xiaogang Liu
- Applicant: Chad A. Mirkin , Vinayak P. Dravid , Ming Su , Xiaogang Liu
- Applicant Address: US IL Evanston
- Assignee: Northwestern University
- Current Assignee: Northwestern University
- Current Assignee Address: US IL Evanston
- Agency: Foley & Lardner LLP
- Main IPC: B05D5/00
- IPC: B05D5/00 ; B05D3/02
Abstract:
The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.
Public/Granted literature
- US20080044575A1 PATTERNING OF SOLID STATE FEATURES BY DIRECT WRITE NANOLITHOGRAPHIC PRINTING Public/Granted day:2008-02-21
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