Invention Grant
- Patent Title: Method for high spatial resolution examination of samples
- Patent Title (中): 样品高空间分辨率检测方法
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Application No.: US11653444Application Date: 2007-01-16
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Publication No.: US07830506B2Publication Date: 2010-11-09
- Inventor: Hilmar Gugel , Marcus Dyba , Volker Seyfried
- Applicant: Hilmar Gugel , Marcus Dyba , Volker Seyfried
- Applicant Address: DE Wetzlar
- Assignee: Leica Microsystems CMS GmbH
- Current Assignee: Leica Microsystems CMS GmbH
- Current Assignee Address: DE Wetzlar
- Agency: Foley & Lardner LLP
- Priority: DE102006009830 20060301
- Main IPC: G01J3/30
- IPC: G01J3/30

Abstract:
A method for high spatial resolution examination of a sample, the sample to be examined including a substance that can be repeatedly converted from a first state into a second state, the first and the second states differing from one another in at least one optical property. The method includes: a) bringing the substance into the first state by means of a switching signal in a sample region to be recorded, b)inducing the second state by means of an optical signal, spatially delimited subregions being specifically excluded within the sample region to be recorded, c) reading out the remaining first states, and d) steps a) to c) are repeated, the optical signal being displaced upon each repetition in order to scan the sample, wherein the individual steps a) to d) are carried out in a sequence adapted to the respective measuring situation.
Public/Granted literature
- US20070206277A1 Method for high spatial resolution examination of samples Public/Granted day:2007-09-06
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