Invention Grant
US07844941B2 Charged particle beam exposure method and charged particle beam exposure device
有权
带电粒子束曝光方法和带电粒子束曝光装置
- Patent Title: Charged particle beam exposure method and charged particle beam exposure device
- Patent Title (中): 带电粒子束曝光方法和带电粒子束曝光装置
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Application No.: US12508642Application Date: 2009-07-24
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Publication No.: US07844941B2Publication Date: 2010-11-30
- Inventor: Yasushi Takahashi
- Applicant: Yasushi Takahashi
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2004-212517 20040721
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G21K5/10 ; H01J37/08 ; H01L21/027
Abstract:
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both sides of the space, and portions other than the edge portions of the large patterns on both sides are exposed by a variable rectangular beam or by using another block mask.
Public/Granted literature
- US20090288060A1 CHARGED PARTICLE BEAM EXPOSURE METHOD AND CHARGED PARTICLE BEAM EXPOSURE DEVICE Public/Granted day:2009-11-19
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