Invention Grant
US07869026B2 Targeted artifacts and methods for evaluating 3-D coordinate system measurement accuracy of optical 3-D measuring systems using such targeted artifacts 有权
用于评估使用这种目标人工制品的光学3-D测量系统的3-D坐标系测量精度的目标工件和方法

Targeted artifacts and methods for evaluating 3-D coordinate system measurement accuracy of optical 3-D measuring systems using such targeted artifacts
Abstract:
A method for evaluating three-dimensional (3-D) coordinate system measurement accuracy of an optical 3-D measuring system using targeted artifacts is provided. In this regard, an exemplary embodiment of a method for evaluating 3-D coordinate system measurement accuracy using targeted artifacts comprises: taking a series of measurements from different positions and orientations using target dots on a targeted artifact with an optical 3-D measuring system; and calculating measurement errors using the series of measurements. An exemplary embodiment of a targeted artifact used with the method includes a base and target dots located on the base.
Information query
Patent Agency Ranking
0/0