Invention Grant
- Patent Title: Semiconductor circuit including a long channel device and a short channel device
- Patent Title (中): 半导体电路包括长沟道器件和短沟道器件
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Application No.: US12181180Application Date: 2008-07-28
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Publication No.: US07880236B2Publication Date: 2011-02-01
- Inventor: Andreas Kerber , Kingsuk Maitra
- Applicant: Andreas Kerber , Kingsuk Maitra
- Applicant Address: US TX Austin
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US TX Austin
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A semiconductor circuit is provided that includes a short channel device, and a long channel device that is electrically isolated from the short channel device. The long channel device comprises a plurality of first gate electrodes, a first source region adjacent one of the plurality of first gate electrodes, a first drain region adjacent another of the plurality of first gate electrodes, and a plurality of common source/drain regions positioned between adjacent ones of the plurality of first gate electrodes. The first gate electrodes each overlie portions of a layer of high-dielectric constant (k) gate insulator material. Each of the first gate electrodes are electrically coupled to at least one of the other first gate electrodes.
Public/Granted literature
- US20100019313A1 SEMICONDUCTOR CIRCUIT INCLUDING A LONG CHANNEL DEVICE AND A SHORT CHANNEL DEVICE Public/Granted day:2010-01-28
Information query
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