Invention Grant
- Patent Title: Colorless single-crystal CVD diamond at rapid growth rate
- Patent Title (中): 无色单晶CVD金刚石生长速度快
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Application No.: US11438260Application Date: 2006-05-23
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Publication No.: US07883684B2Publication Date: 2011-02-08
- Inventor: Russell J. Hemley , Ho-kwang Mao , Chih-shiue Yan
- Applicant: Russell J. Hemley , Ho-kwang Mao , Chih-shiue Yan
- Applicant Address: US DC Washington
- Assignee: Carnegie Institution of Washington
- Current Assignee: Carnegie Institution of Washington
- Current Assignee Address: US DC Washington
- Agency: Morgan Lewis & Bockius LLP
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C01B31/06

Abstract:
The present invention relates to a method for producing colorless, single-crystal diamonds at a rapid growth rate. The method for diamond production includes controlling temperature of a growth surface of the diamond such that all temperature gradients across the growth surface of the diamond are less than about 20° C., and growing single-crystal diamond by microwave plasma chemical vapor deposition on the growth surface of a diamond at a growth temperature in a deposition chamber having an atmosphere, wherein the atmosphere comprises from about 8% to about 20% CH4 per unit of H2 and from about 5 to about 25% O2 per unit of CH4. The method of the invention can produce diamonds larger than 10 carats. Growth rates using the method of the invention can be greater than 50 μm/hour.
Public/Granted literature
- US20070196263A1 Colorless single-crystal CVD diamond at rapid growth rate Public/Granted day:2007-08-23
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