Invention Grant
- Patent Title: Wide area soft defect localization
- Patent Title (中): 广域软缺陷定位
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Application No.: US12133305Application Date: 2008-06-04
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Publication No.: US07884633B2Publication Date: 2011-02-08
- Inventor: Ronald M. Potok , Rama R. Goruganthu , David E. Kloster , Norman E. Rhodes
- Applicant: Ronald M. Potok , Rama R. Goruganthu , David E. Kloster , Norman E. Rhodes
- Applicant Address: US CA Sunnyvale
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agent Timothy M. Honeycutt
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
Various apparatus and methods of testing a semiconductor chip for soft defects are disclosed. In one aspect, a method of testing a semiconductor chip that has a surface and plural circuit structures positioned beneath the surface is provided. An external stimulus is applied to a series of fractional portions of the surface to perturb portions of the plural circuit structures such that at least one of the series of fractional portions is smaller than another of the series of fractional portions. The semiconductor chip is caused to perform a test pattern during the application of external stimulus to each of the fractional portions to determine if a soft defect exists in any of the series of fractional portions.
Public/Granted literature
- US20090302880A1 Wide Area Soft Defect Localization Public/Granted day:2009-12-10
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