Invention Grant
- Patent Title: Methods for sample preparation and observation, charged particle apparatus
- Patent Title (中): 样品制备和观察方法,带电粒子装置
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Application No.: US12353303Application Date: 2009-01-14
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Publication No.: US07915581B2Publication Date: 2011-03-29
- Inventor: Tohru Ishitani , Uki Kabasawa , Tsuyoshi Ohnishi
- Applicant: Tohru Ishitani , Uki Kabasawa , Tsuyoshi Ohnishi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2005-200833 20050708
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00 ; A61N5/00 ; H01J37/08

Abstract:
In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation in focus, are corrected, the deviations occurring when a processed cross section moves in the depth direction thereof; information on a height and a tilt of a surface of cross section processing area is calculated before the processing, the above information is used, the deviation in a field of view and the deviation in focus in SEM observation, which correspond to an amount of movement of the cross section at a time of the processing, are predicted, and the SEM is controlled based on the predicted values.
Public/Granted literature
- US20090127458A1 Methods for Sample Preparation and Observation, Charged Particle Apparatus Public/Granted day:2009-05-21
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