Invention Grant
US07919792B2 Standard cell architecture and methods with variable design rules
有权
标准单元结构和具有可变设计规则的方法
- Patent Title: Standard cell architecture and methods with variable design rules
- Patent Title (中): 标准单元结构和具有可变设计规则的方法
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Application No.: US12338632Application Date: 2008-12-18
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Publication No.: US07919792B2Publication Date: 2011-04-05
- Inventor: Oscar M. K. Law , Manoj Achyutrao Joshi , Kong-Beng Thei , Harry Chuang
- Applicant: Oscar M. K. Law , Manoj Achyutrao Joshi , Kong-Beng Thei , Harry Chuang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L27/10
- IPC: H01L27/10 ; H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113

Abstract:
Structures and methods for standard cell layouts having variable rules for spacing of layers to cell boundaries are disclosed. In one embodiment, a first standard cell layout is provided with a conductive layer having at least two portions spaced apart by a minimum spacing distance, the conductive layer having at least one portion spaced from a cell boundary by a first spacing distance of less than half of the minimum spacing distance; a second standard cell disposed adjacent the first standard cell with at least one second portion of the conductive layer in the second cell disposed adjacent the first portion in the first standard cell and spaced apart from a common cell boundary by a second spacing greater than half of the minimum; wherein the sum of the first and second spacings is at least as great as the minimum spacing. A method for forming standard is disclosed.
Public/Granted literature
- US20100155783A1 Standard Cell Architecture and Methods with Variable Design Rules Public/Granted day:2010-06-24
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