Invention Grant
- Patent Title: Analysis method and analysis apparatus
- Patent Title (中): 分析方法和分析仪器
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Application No.: US12280845Application Date: 2007-06-21
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Publication No.: US07923680B2Publication Date: 2011-04-12
- Inventor: Kazuya Dobashi , Shigeru Kawamura , Kohei Tsugita , Teruyuki Hayashi
- Applicant: Kazuya Dobashi , Shigeru Kawamura , Kohei Tsugita , Teruyuki Hayashi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-196946 20060719
- International Application: PCT/JP2007/062526 WO 20070621
- International Announcement: WO2008/010385 WO 20080124
- Main IPC: H01J49/00
- IPC: H01J49/00
Abstract:
An analysis apparatus includes a first process part for removing a film formed on a substrate by irradiating the film with ultraviolet light, a second process part for providing a solution onto a surface of the substrate for dissolving an object being analyzed on the substrate, and a third process part for analyzing the object being analyzed in the solution that is used in the second step.
Public/Granted literature
- US20090218483A1 Analyzing Method and Analyzing Apparatus Public/Granted day:2009-09-03
Information query
