Invention Grant
- Patent Title: Scribe process monitoring methodology
- Patent Title (中): 抄写程序监控方法
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Application No.: US12207403Application Date: 2008-09-09
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Publication No.: US07956337B2Publication Date: 2011-06-07
- Inventor: Vicky Svidenko , Tzay-Fa (Jeff) Su , Chuck Luu
- Applicant: Vicky Svidenko , Tzay-Fa (Jeff) Su , Chuck Luu
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, L.L.P.
- Main IPC: H01J49/00
- IPC: H01J49/00 ; A61N5/00

Abstract:
One embodiment of the present invention sets forth a computer-implemented method for tuning laser scribe parameters during the fabrication of a solar module. The method includes analyzing the visual appearance of a laser scribe to extract various morphological parameters related to the quality of a laser scribe process used to produce the scribe. Based on the morphological parameters, the laser scribe parameters may be modified in-situ to achieve settings that are optimal for performing laser scribing in each layer of the solar module. As a result, laser scribe process cycle time may be minimized while providing better indication of the laser scribe process stability and quality relative to the prior art approaches.
Public/Granted literature
- US20100059693A1 SCRIBE PROCESS MONITORING METHODOLOGY Public/Granted day:2010-03-11
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