Invention Grant
- Patent Title: Resistivity testing method and device therefor
- Patent Title (中): 电阻率测试方法及其设备
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Application No.: US12934717Application Date: 2009-07-02
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Publication No.: US07956999B2Publication Date: 2011-06-07
- Inventor: Satoshi Sakai , Akemi Takano , Yasuyuki Kobayashi , Kengo Yamaguchi
- Applicant: Satoshi Sakai , Akemi Takano , Yasuyuki Kobayashi , Kengo Yamaguchi
- Applicant Address: JP
- Assignee: Mitsubishi Heavy Industries, Ltd.
- Current Assignee: Mitsubishi Heavy Industries, Ltd.
- Current Assignee Address: JP
- Agency: Kanesaka Berner and Partners LLP
- Priority: JP2008-207062 20080811
- International Application: PCT/JP2009/062117 WO 20090702
- International Announcement: WO2010/018717 WO 20100218
- Main IPC: G01J4/00
- IPC: G01J4/00 ; G01B11/28

Abstract:
An object is to efficiently measure the resistivity of a transparent conductive film with high accuracy in a non-destructive and non-contact manner. Provided is a resistivity testing device that includes a light emitting device that emits p-polarized emission light having a wavelength selected by a preliminarily performed test-condition selecting method toward a transparent conductive film, formed on a light-transmissive substrate conveyed along a manufacturing line, from a film-surface side at an incidence angle selected by the method; a light detecting device that detects reflected light reflected at the transparent conductive film; and an information processor that calculates an evaluation value related to the amount of light of the reflected light with respect to the wavelength on the basis of the intensity of the detected light and obtains a resistivity from the calculated evaluation value by using a correlation characteristic in which the evaluation value and the resistivity are associated with each other in advance.
Public/Granted literature
- US20110019190A1 RESISTIVITY TESTING METHOD AND DEVICE THEREFOR Public/Granted day:2011-01-27
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