Invention Grant
- Patent Title: Method and apparatus for making a radio frequency inlay
- Patent Title (中): 制作射频嵌体的方法和装置
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Application No.: US11860162Application Date: 2007-09-24
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Publication No.: US07971339B2Publication Date: 2011-07-05
- Inventor: David Finn
- Applicant: David Finn
- Applicant Address: DE
- Assignee: HID Global GmbH
- Current Assignee: HID Global GmbH
- Current Assignee Address: DE
- Agency: Sheridan Ross P.C.
- Main IPC: H01P11/00
- IPC: H01P11/00

Abstract:
A method and apparatus are provided for making radio frequency (RF) inlays. The RF inlays include an integrated circuit and an antenna affixed to a substrate material carrying the integrated circuit. During processing, portions of the wire forming the antenna are located adjacent to, but not directly over the integrated circuit. In the subsequent processing step, the wire ends are placed in contact with and secured to the integrated circuit terminal areas.
Public/Granted literature
- US20100141453A1 Method and Apparatus for Making a Radio Frequency Inlay Public/Granted day:2010-06-10
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