Invention Grant
US07977628B2 System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
有权
通过将光束互补孔径形状与光束形状匹配来减少颗粒和污染的系统和方法
- Patent Title: System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
- Patent Title (中): 通过将光束互补孔径形状与光束形状匹配来减少颗粒和污染的系统和方法
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Application No.: US12146122Application Date: 2008-06-25
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Publication No.: US07977628B2Publication Date: 2011-07-12
- Inventor: John Francis Grant , Patrick Richard Splinter
- Applicant: John Francis Grant , Patrick Richard Splinter
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J49/00
- IPC: H01J49/00
Abstract:
An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.
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