Invention Grant
US07989563B2 Resin compositions, films using the same and process for producing the films
有权
树脂组合物,使用其的薄膜和制造薄膜的方法
- Patent Title: Resin compositions, films using the same and process for producing the films
- Patent Title (中): 树脂组合物,使用其的薄膜和制造薄膜的方法
-
Application No.: US12388077Application Date: 2009-02-18
-
Publication No.: US07989563B2Publication Date: 2011-08-02
- Inventor: Masahito Nakabayashi , Mamoru Kobayashi
- Applicant: Masahito Nakabayashi , Mamoru Kobayashi
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Lintec Corporation,Showa Denko K.K.
- Current Assignee: Lintec Corporation,Showa Denko K.K.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-039011 20080220
- Main IPC: C08F222/10
- IPC: C08F222/10 ; B05D3/06

Abstract:
The present invention provides a resin composition containing a reactive monomer and/or oligomer having allyl ester groups, a film of the resin composition which is excellent in transparency and heat resistance and has a high thickness precision, and a process for producing such a film. The resin composition includes (A) a reactive oligomer having allyl ester groups and represented by the general formula (1): wherein R1 represents an alkanediyl or alkenediyl group having 1 to 4 carbon atoms with the proviso that a plurality of R1 groups may be the same or different, R2 represents a cycloalkanediyl, cycloalkenediyl or arenediyl group with the proviso that a plurality of R2 groups may be the same or different, and n represents an average degree of polymerization and is a number of 1 to 30; (B) a polyfunctional (meth)acrylic monomer and/or oligomer; and (C) a thermal polymerization initiator.
Public/Granted literature
- US20090209718A1 RESIN COMPOSITIONS, FILMS USING THE SAME AND PROCESS FOR PRODUCING THE FILMS Public/Granted day:2009-08-20
Information query
IPC分类: