Invention Grant
- Patent Title: Sample inspection apparatus
- Patent Title (中): 样品检验仪
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Application No.: US12416914Application Date: 2009-04-01
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Publication No.: US07989766B2Publication Date: 2011-08-02
- Inventor: Yasuhiko Nara , Tohru Ando , Masahiro Sasajima , Tsutomu Saito , Tomoharu Obuki , Isamu Sekihara
- Applicant: Yasuhiko Nara , Tohru Ando , Masahiro Sasajima , Tsutomu Saito , Tomoharu Obuki , Isamu Sekihara
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2008-096699 20080403
- Main IPC: H01J37/28
- IPC: H01J37/28

Abstract:
A sample inspection apparatus in which a fault in a semiconductor sample can be measured and analyzed efficiently. A plurality of probes are brought into contact with the sample. The sample is irradiated with an electron beam while a current flowing through the probes is measured. Signals from at least two probes are supplied to an image processing unit so as to form an absorbed electron current image. A difference between images obtained in accordance with a temperature change of the sample is obtained. A faulty point is identified from the difference between the images.
Public/Granted literature
- US20090250610A1 SAMPLE INSPECTION APPARATUS Public/Granted day:2009-10-08
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