Invention Grant
- Patent Title: System and method for azimuth angle calibration
- Patent Title (中): 方位角校准系统和方法
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Application No.: US12169331Application Date: 2008-07-08
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Publication No.: US07990534B2Publication Date: 2011-08-02
- Inventor: Shifang Li
- Applicant: Shifang Li
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: G01J4/00
- IPC: G01J4/00
Abstract:
An improved procedure for calibrating the azimuth angle in a metrology module for use in a metrology system that is used for measuring a target on a wafer, and the metrology modules can include oblique Spectroscopic Ellipsometry (SE) and unpolarized or polarized spectroscopic reflectometer devices.
Public/Granted literature
- US20100010765A1 System and Method for Azimuth Angle Calibration Public/Granted day:2010-01-14
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