Invention Grant
US07993947B2 Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates
有权
硅/锗氧化物颗粒油墨,喷墨印刷和掺杂半导体衬底的工艺
- Patent Title: Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates
- Patent Title (中): 硅/锗氧化物颗粒油墨,喷墨印刷和掺杂半导体衬底的工艺
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Application No.: US13011596Application Date: 2011-01-21
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Publication No.: US07993947B2Publication Date: 2011-08-09
- Inventor: Henry Hieslmair , Shivkumar Chiruvolu , Hui Du
- Applicant: Henry Hieslmair , Shivkumar Chiruvolu , Hui Du
- Applicant Address: US CA Milpitas
- Assignee: NanoGram Corporation
- Current Assignee: NanoGram Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Dardi & Herbert, PLLC
- Agent Peter S. Dardi
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/06

Abstract:
Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
Public/Granted literature
- US20110109688A1 SILICON/GERMANIUM OXIDE PARTICLE INKS, INKJET PRINTING AND PROCESSES FOR DOPING SEMICONDUCTOR SUBSTRATES Public/Granted day:2011-05-12
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