Invention Grant
US07993947B2 Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates 有权
硅/锗氧化物颗粒油墨,喷墨印刷和掺杂半导体衬底的工艺

Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates
Abstract:
Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
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