Invention Grant
- Patent Title: Laser desorption ionization ion source with charge injection
- Patent Title (中): 激光解吸电离离子源与电荷注入
-
Application No.: US11800458Application Date: 2007-05-04
-
Publication No.: US07994474B2Publication Date: 2011-08-09
- Inventor: Andreas Hieke
- Applicant: Andreas Hieke
- Applicant Address: US CA Cupertino
- Assignee: Andreas Hieke
- Current Assignee: Andreas Hieke
- Current Assignee Address: US CA Cupertino
- Agency: Jones IP Group
- Main IPC: H01J49/00
- IPC: H01J49/00 ; B01D59/44
Abstract:
An innovative ion source is disclosed that in some embodiments provides an injected independent ion beam to increase the ionization efficiency of the ion source.
Public/Granted literature
- US20080121798A1 Laser desorption ionization ion source with charge injection Public/Granted day:2008-05-29
Information query
