Invention Grant
- Patent Title: Method of detecting arc discharges in a plasma process
- Patent Title (中): 在等离子体工艺中检测电弧放电的方法
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Application No.: US11534240Application Date: 2006-09-22
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Publication No.: US08007641B2Publication Date: 2011-08-30
- Inventor: Markus Winterhalter , Peter Wiedemuth
- Applicant: Markus Winterhalter , Peter Wiedemuth
- Applicant Address: DE Freiburg
- Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee Address: DE Freiburg
- Agency: Fish & Richardson P.C.
- Priority: DE102004015090 20040325
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/32 ; H01J17/26 ; H01J61/28 ; H05B37/02 ; H05B39/04 ; H05B41/36 ; C23F1/00 ; H01L21/306
Abstract:
An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.
Public/Granted literature
- US20070073498A1 METHOD OF DETECTING ARC DISCHARGES IN A PLASMA PROCESS Public/Granted day:2007-03-29
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