Invention Grant
- Patent Title: Metrology of optics with high aberrations
- Patent Title (中): 具有高像差的光学计量学
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Application No.: US12472362Application Date: 2009-05-26
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Publication No.: US08018602B1Publication Date: 2011-09-13
- Inventor: Mikhail Gutin
- Applicant: Mikhail Gutin
- Applicant Address: US NY Troy
- Assignee: Applied Science Innovations, Inc.
- Current Assignee: Applied Science Innovations, Inc.
- Current Assignee Address: US NY Troy
- Agent Jay R. Yablon
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
Disclosed herein is an interferometry device and associated method and computerized media for testing optical components including those with high aberrations, comprising: situating an optical component under test between a source of a spherical test wavefront and a reference mirror; propagating a spherical test wavefront, whereby an axial line is defined by a direction of propagation of said wavefront; deriving a substantially complete first-tilt-alignment wavefront metrology of the optical component under test from a plurality of first-tilt-alignment interferograms obtained with the optical component under test held fixed at a first predetermined tilt angle relative to a direction of propagation of said wavefront; and varying an axial displacement between the optical component under test and the spherical reference mirror to obtain each first-tilt-alignment interferogram. By varying the tilt angle, one can also derive a substantially complete surface metrology of the optical component under test.
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