Invention Grant
US08030625B2 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium 有权
电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法

  • Patent Title: Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
  • Patent Title (中): 电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法
  • Application No.: US12401775
    Application Date: 2009-03-11
  • Publication No.: US08030625B2
    Publication Date: 2011-10-04
  • Inventor: Kazunori KomatsuToshihiro Usa
  • Applicant: Kazunori KomatsuToshihiro Usa
  • Applicant Address: JP Tokyo
  • Assignee: Fujifilm Corporation
  • Current Assignee: Fujifilm Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Young & Thompson
  • Priority: JP2008-063501 20080313
  • Main IPC: G21K5/10
  • IPC: G21K5/10 H01J37/08
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
Abstract:
When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a predetermined rotational position of the substrate by a blanking-OFF signal, performing writing in a rotational direction of the substrate along with the rotation of the substrate, and terminating the writing by a blanking-ON signal based on write data to perform writing for one round, and repeating the writing based on the ON/OFF control by moving the electron beam or substrate in a radial direction of the substrate and rotation control is performed for controlling the rotation speed of the rotation stage so as to be increased for inner track writing and decreased for outer track writing inversely proportional to the radius of the writing position.
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