Invention Grant
US08111397B2 Plate inspection system and plate inspection method 有权
板检系统和板检查方法

  • Patent Title: Plate inspection system and plate inspection method
  • Patent Title (中): 板检系统和板检查方法
  • Application No.: US12067380
    Application Date: 2007-05-14
  • Publication No.: US08111397B2
    Publication Date: 2012-02-07
  • Inventor: Norihisa Moriya
  • Applicant: Norihisa Moriya
  • Applicant Address: JP Shinjuku-Ku
  • Assignee: Dai Nippon Printing Co., Ltd.
  • Current Assignee: Dai Nippon Printing Co., Ltd.
  • Current Assignee Address: JP Shinjuku-Ku
  • Agency: Burr & Brown
  • Priority: JP2006-135460 20060515; JP2007-054669 20070305
  • International Application: PCT/JP2007/059884 WO 20070514
  • International Announcement: WO2007/132818 WO 20071122
  • Main IPC: G01J4/00
  • IPC: G01J4/00
Plate inspection system and plate inspection method
Abstract:
A plate inspection system and a plate inspection method with which irregularities in phase difference caused in a retardation layer can be efficiently detected. The inspection system is for inspecting a plate to be inspected having a retardation layer. The plate inspection system comprises a polarized-light source for irradiating a polarized light and an observation-side polarizer placed on the observation side. In the inspection system, a plate to be inspected is placed between the polarized-light source and the observation-side polarizer so that the plate to be inspected is irradiated with polarized light from the polarized-light source. The position of at least the observation-side polarizer or the plate to be inspected is changeable relative to the polarized-light source.
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