Invention Grant
- Patent Title: Light receiving device
- Patent Title (中): 光接收装置
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Application No.: US12522296Application Date: 2008-01-07
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Publication No.: US08120061B2Publication Date: 2012-02-21
- Inventor: Yasuhiro Iguchi , Yuichi Kawamura
- Applicant: Yasuhiro Iguchi , Yuichi Kawamura
- Applicant Address: JP Osaka-shi JP Sakai-shi
- Assignee: Sumitomo Electric Industries, Ltd.,Osaka Prefecture University Public Corporation
- Current Assignee: Sumitomo Electric Industries, Ltd.,Osaka Prefecture University Public Corporation
- Current Assignee Address: JP Osaka-shi JP Sakai-shi
- Agency: Venable LLP
- Agent Michael A. Sartori, Ph.D.
- Priority: JP2007-002104 20070110
- International Application: PCT/JP2008/050026 WO 20080107
- International Announcement: WO2008/084772 WO 20080717
- Main IPC: H01L31/102
- IPC: H01L31/102

Abstract:
A light receiving device having small dark current and capable of sensing light in the wavelength range of 2.0 μm to 3.0 μm with high sensitivity is provided. The light receiving device has an InP substrate, and a light receiving layer formed by alternately stacking a larger layer formed of GaInNAsSbP mixed crystal having nitrogen content of at most 5% in 5 group, larger lattice constant than that of InP and thickness between hc and 11hc, the critical thickness hc being determined as hc=b(1−ν cos2α){log(hc/b)+1}/8πf(1+ν)cos λ and a smaller layer formed of GaInNAsSbP mixed crystal having nitrogen content of at most 5% in 5 group, smaller lattice constant than that of InP and thickness between hc and 11hc; absolute value of lattice mismatch of the larger layer and the smaller layer to the InP substrate is at least 0.5% and at most 5%; at least one of the layers has absorption edge wavelength of 2.0 μm to 3.0 μm; total thickness of respective layers is 2.0 μm to 4.0 μm; and thickness-weighted average lattice mismatch is set to be at most ±0.2%.
Public/Granted literature
- US20090321785A1 LIGHT RECEIVING DEVICE Public/Granted day:2009-12-31
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