Invention Grant
- Patent Title: Wafer level integrated interconnect decal and manufacturing method thereof
- Patent Title (中): 晶圆级集成互连贴花及其制造方法
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Application No.: US12731793Application Date: 2010-03-25
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Publication No.: US08138020B2Publication Date: 2012-03-20
- Inventor: Peter A. Gruber , Jae-Woong Nah
- Applicant: Peter A. Gruber , Jae-Woong Nah
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A wafer level integrated interconnect decal manufacturing method and wafer level integrated interconnect decal arrangement. In accordance with the technology concerning the soldering of integrated circuits and substrates, and particularly providing for solder decal methods forming and utilization, in the present instance there are employed underfills which consist of a solid film material and which are applied between a semiconductor chip and the substrate in order to enhance the reliability of a flip chip package. In particular, the underfill material increases the resistance to fatigue of controlled collapse chip connect (C4) bumps.
Public/Granted literature
- US20110233762A1 WAFER LEVEL INTEGRATED INTERCONNECT DECAL AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-09-29
Information query
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