Invention Grant
- Patent Title: Film stress management for MEMS through selective relaxation
- Patent Title (中): 通过选择性放松对MEMS的薄膜应力管理
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Application No.: US11968399Application Date: 2008-01-02
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Publication No.: US08138495B2Publication Date: 2012-03-20
- Inventor: George Patrick Watson
- Applicant: George Patrick Watson
- Applicant Address: FR Paris
- Assignee: Alcatel Lucent
- Current Assignee: Alcatel Lucent
- Current Assignee Address: FR Paris
- Agency: Hitt Gaines, PC
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00
Abstract:
An apparatus comprising a microelectromechanical system. The microelectromechanical system includes a crystalline structural element having dislocations therein. For at least about 60 percent of adjacent pairs of the dislocations, direction vectors of the dislocations form acute angles of less than about 45 degrees.
Public/Granted literature
- US20120038010A1 FILM STRESS MANAGEMENT FOR MEMS THROUGH SELECTIVE RELAXATION Public/Granted day:2012-02-16
Information query
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