Invention Grant
- Patent Title: Microengineered vacuum interface for an ionization system
- Patent Title (中): 用于电离系统的微型工程真空接口
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Application No.: US12837100Application Date: 2010-07-15
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Publication No.: US08148681B2Publication Date: 2012-04-03
- Inventor: Richard Syms , Richard William Moseley
- Applicant: Richard Syms , Richard William Moseley
- Applicant Address: GB Woking, Surrey
- Assignee: Microsaic Systems PLC
- Current Assignee: Microsaic Systems PLC
- Current Assignee Address: GB Woking, Surrey
- Agency: Bishop & Diehl, Ltd.
- Priority: GB0611221.3 20060608; GB0620256.8 20061012
- Main IPC: H01J49/00
- IPC: H01J49/00 ; B01D59/44

Abstract:
A planar component for interfacing an atmospheric pressure ionizer to a vacuum system is described. The component combines electrostatic optics and skimmers with an internal chamber that can be filled with a gas at a prescribed pressure and is fabricated by lithography, etching and bonding of silicon.
Public/Granted literature
- US20100276590A1 Microengineered Vacuum Interface for an Ionization System Public/Granted day:2010-11-04
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