Invention Grant
- Patent Title: Line scanning measurement system
- Patent Title (中): 行扫描测量系统
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Application No.: US12622946Application Date: 2009-11-20
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Publication No.: US08154725B2Publication Date: 2012-04-10
- Inventor: Fu Shiang Yang
- Applicant: Fu Shiang Yang
- Applicant Address: TW Chutung, Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Chutung, Hsinchu
- Agency: Egbert Law Offices PLLC
- Priority: TW98130482A 20090910
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
A line scanning measurement system includes an illumination apparatus, a support, a telecentric optical element and a processor. The illumination apparatus is utilized for providing an extended polarized light beam. The support is utilized for mounting a sample, and the extended polarized light beam is directed at the sample. The telecentric optical element is utilized for directing a measurement light beam that has interacted with the sample toward a line scanning detector. The processor is utilized for obtaining the characteristic information of the sample in accordance with the signal measured by the line scanning detector.
Public/Granted literature
- US20110058169A1 LINE SCANNING MEASUREMENT SYSTEM Public/Granted day:2011-03-10
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