Invention Grant
- Patent Title: Charged particle beam masking for laser ablation micromachining
- Patent Title (中): 用于激光烧蚀微加工的带电粒子束掩模
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Application No.: US12324296Application Date: 2008-11-26
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Publication No.: US08168961B2Publication Date: 2012-05-01
- Inventor: Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
- Applicant: Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Griner, LLP
- Agent Michael O. Scheinberg; Robert J. Amedeo
- Main IPC: G21G5/00
- IPC: G21G5/00

Abstract:
An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
Public/Granted literature
- US20100127190A1 CHARGED PARTICLE BEAM MASKING FOR LASER ABLATION MICROMACHINING Public/Granted day:2010-05-27
Information query
IPC分类:
G | 物理 |
G21 | 核物理;核工程 |
G21G | 化学元素的转变;放射源 |
G21G5/00 | 通过化学反应进行化学元素的推断转变 |