Invention Grant
US08168961B2 Charged particle beam masking for laser ablation micromachining 有权
用于激光烧蚀微加工的带电粒子束掩模

Charged particle beam masking for laser ablation micromachining
Abstract:
An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
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