Invention Grant
- Patent Title: Exhaust-gas aftertreatment device
- Patent Title (中): 废气后处理装置
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Application No.: US12380581Application Date: 2009-02-26
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Publication No.: US08201393B2Publication Date: 2012-06-19
- Inventor: Friedrich Zapf , Heico Stegmann , Andreas Lannig , Klaus Lang , Christian Schmidt , Alexandre Branco
- Applicant: Friedrich Zapf , Heico Stegmann , Andreas Lannig , Klaus Lang , Christian Schmidt , Alexandre Branco
- Applicant Address: DE Marktheidenfeld
- Assignee: Hilite Germany GmbH
- Current Assignee: Hilite Germany GmbH
- Current Assignee Address: DE Marktheidenfeld
- Agency: Lipsitz & McAllister, LLC
- Priority: DE102008012780 20080305
- Main IPC: F01N3/00
- IPC: F01N3/00

Abstract:
The invention relates to an exhaust-gas aftertreatment device, comprising a control unit (4) for controlling a diaphragm pump (2) that draws a urea/water solution out of a circuit and pumps it, via a pressure filter (3), to a metering unit comprising an atomizing nozzle for atomizing the urea/water solution into an exhaust-gas stream.In advantageous developments, the metering unit comprises a metering valve, including an atomizing nozzle, a pressure and temperature sensor, a heating means and a return baffle.
Public/Granted literature
- US20090229258A1 Exhaust-Gas Aftertreatment Device Public/Granted day:2009-09-17
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