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US08221902B2 Oxyfluoride in the form of a film and preparation method 有权
氟氧化物以薄膜形式制备方法

Oxyfluoride in the form of a film and preparation method
Abstract:
The invention relates to a nanostructured porous oxyfluoride film deposited onto a substrate, to a method for its production, and also to various applications.The oxyfluoride has a porous semicrystalline structure and a refractive index of 1.08 to 1.25, measured in the visible range for a relative humidity level below 80%. Its chemical composition corresponds to the formula (Mg(1−x)Cax)(1−y)MyF(2+(n−2)y−2z−t)Oz(OH)tM′w in which n is the valency of M, n being 1 to 4, M represents at least one element chosen from Al, Si, Ge and Ga, M′ represents at least one element chosen from the group composed of Co, Cr, Ni, Fe, Cu, Sb, Ag, Pd, Cd, Au, Sn, Pb, Ce, Nd, Pr, Eu, Yb, Tb, Dy, Er and Gd, and 0≦w 0 and t
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