Invention Grant
US08223330B2 Nanostructures and lithographic method for producing highly sensitive substrates for surface-enhanced spectroscopy
有权
制备用于表面增强光谱的高灵敏度基材的纳米结构和平版印刷方法
- Patent Title: Nanostructures and lithographic method for producing highly sensitive substrates for surface-enhanced spectroscopy
- Patent Title (中): 制备用于表面增强光谱的高灵敏度基材的纳米结构和平版印刷方法
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Application No.: US12029631Application Date: 2008-02-12
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Publication No.: US08223330B2Publication Date: 2012-07-17
- Inventor: Douglas Natelson , Daniel Robert Ward , Zachary Kyle Keane
- Applicant: Douglas Natelson , Daniel Robert Ward , Zachary Kyle Keane
- Applicant Address: US TX Houston
- Assignee: William Marsh Rice University
- Current Assignee: William Marsh Rice University
- Current Assignee Address: US TX Houston
- Agency: 24IP Law Group
- Agent Timothy R. DeWitt
- Main IPC: G01J3/44
- IPC: G01J3/44 ; B44C1/22 ; H01L21/44

Abstract:
A method for producing planar extended electrodes with nanoscale spacings that exhibit very large SERS signals, with each nanoscale gap having one well-defined hot spot. The resulting highly sensitive substrate has extended metal electrodes separated by a nanoscale gap. The electrodes act as optical antennas to enhance dramatically the local electromagnetic field for purposes of spectroscopy or nonlinear optics. SERS response is consistent with a very small number of molecules in the hotspot, showing blinking and wandering of Raman lines. Sensitivity is sufficiently high that SERS from physisorbed atmospheric contaminants may be detected after minutes of exposure to ambient conditions.
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